PHOTOSENSITIVE RESIN COMPOSITION PHOTOLITHOGRAPHY PROCESS USING THE SAME PIXEL DEFINE LAYER PREPARED BY USING THE SAME AND ELECTRONIC DEVICE COMPRISING THE PIXEL DEFINE LAYER
본원은 감광성 수지 조성물, 상기 감광성 수지 조성물을 이용하는 사진식각 공정, 상기 사진식각 공정을 이용하여 제조된 화소 구획 층, 및 상기 화소 구획 층을 포함하는 전자 소자에 관한 것이다.
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| Main Authors | , |
|---|---|
| Format | Patent |
| Language | English Korean |
| Published |
27.04.2021
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| Subjects | |
| Online Access | Get full text |
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| Abstract | 본원은 감광성 수지 조성물, 상기 감광성 수지 조성물을 이용하는 사진식각 공정, 상기 사진식각 공정을 이용하여 제조된 화소 구획 층, 및 상기 화소 구획 층을 포함하는 전자 소자에 관한 것이다. |
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| AbstractList | 본원은 감광성 수지 조성물, 상기 감광성 수지 조성물을 이용하는 사진식각 공정, 상기 사진식각 공정을 이용하여 제조된 화소 구획 층, 및 상기 화소 구획 층을 포함하는 전자 소자에 관한 것이다. |
| Author | SHI GENGGONGWO PARK LEE SOON |
| Author_xml | – fullname: PARK LEE SOON – fullname: SHI GENGGONGWO |
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| DocumentTitleAlternate | 감광성 수지 조성물, 이를 이용하는 사진식각 공정, 이를 이용하여 제조된 화소 구획 층, 및 상기 화소 구획 층을 포함하는 전자 소자 |
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| Snippet | 본원은 감광성 수지 조성물, 상기 감광성 수지 조성물을 이용하는 사진식각 공정, 상기 사진식각 공정을 이용하여 제조된 화소 구획 층, 및 상기 화소 구획 층을 포함하는 전자 소자에 관한 것이다. |
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| SubjectTerms | APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP |
| Title | PHOTOSENSITIVE RESIN COMPOSITION PHOTOLITHOGRAPHY PROCESS USING THE SAME PIXEL DEFINE LAYER PREPARED BY USING THE SAME AND ELECTRONIC DEVICE COMPRISING THE PIXEL DEFINE LAYER |
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