PHOTOSENSITIVE RESIN COMPOSITION PHOTOLITHOGRAPHY PROCESS USING THE SAME PIXEL DEFINE LAYER PREPARED BY USING THE SAME AND ELECTRONIC DEVICE COMPRISING THE PIXEL DEFINE LAYER

• Main Authors: PARK LEE SOON, SHI GENGGONGWO
• Format: Patent
• Language: English; Korean
• Published: 27.04.2021
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; THEIR PREPARATION OR CHEMICAL WORKING-UP

본원은 감광성 수지 조성물, 상기 감광성 수지 조성물을 이용하는 사진식각 공정, 상기 사진식각 공정을 이용하여 제조된 화소 구획 층, 및 상기 화소 구획 층을 포함하는 전자 소자에 관한 것이다.