5 - 5 - GROUP 5 TRANSITION METAL-CONTAINING COMPOUNDS FOR VAPOR DEPOSITION OF GROUP 5 TRANSITION METAL-CONTAINING FILMS

• Main Authors: NOH WONTAE, LEE JOOHO, LANSALOT MATRAS CLEMENT
• Format: Patent
• Language: English; Korean
• Published: 23.02.2021
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

기재되는 것은 5 족 전이 금속-함유 박막 형성 전구체이다. 또한 기재되는 것은 증착 공정을 통해 하나 이상의 기판 상에 5 족 전이 금속-함유 박막을 증착하기 위한 기재된 전구체의 합성 방법 및 사용 방법이다. Disclosed are Group 5 transition metal-containing thin film forming precursors. Also disclosed are methods of synthesizing and using the disclosed precursors to deposit Group 5 transition metal-containing thin films on one or more substrates via vapor deposition processes.