FILM-FORMING APPARATUS AND FILM-FORMING SYSTEM

• Main Author: HONDA ATSUO
• Format: Patent
• Language: English; Korean
• Published: 23.09.2020
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

There has been a demand for a film formation apparatus having high precision in the operation of an alignment instrument and making a small change of load balance applied to leg parts when the inside of a vacuum chamber is in an atmospheric pressure condition and a decompressed condition. According to the present invention, the film formation apparatus includes a vacuum chamber of which the inside can be decompressed; and a plurality of leg parts supporting the bottom of the vacuum chamber against a floor surface. The vacuum chamber is formed to have an N-gonal projection shape when projected on the floor surface. The film formation apparatus includes an (N+1) number or more of the leg parts. A projection position of the plurality of leg parts on the floor surface ranges within a ring-shaped area included in the projection shape of the vacuum chamber. 진공 챔버의 내부가 대기압인 상태와 감압된 상태에서, 다리부에 가해지는 하중 밸런스의 변화가 작고, 얼라인먼트 기구의 동작 정밀도가 높은 성막 장치가 요구되고 있었다. 본 발명에 따른 성막 장치는 내부를 감압 가능한 진공 챔버와, 상기 진공 챔버의 저면(底面)을 바닥면에 대해 지지하는 복수의 다리부를 갖는 성막 장치로서, 상기 진공 챔버는, 상기 바닥면에 투영했을 때에 투영 형상이 N각형이 되는 형상을 갖고, 상기 성막 장치는, 상기 복수의 다리부를 N+1 이상 가지며, 상기 바닥면에의 상기 복수의 다리부의 투영 위치는, 상기 진공 챔버의 투영 형상 내에 포함되는 환형 영역 안에 존재하는 것을 특징으로 하는 성막 장치이다.