ION BEAM APPARATUS
An objective of the present invention is to provide an ion beam apparatus capable of reducing damage to a sample while switching observation and processing in a short time. As a means to solve the objective of the present invention, the ion beam apparatus switches between an operation mode for irrad...
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| Main Authors | , , |
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| Format | Patent |
| Language | English Korean |
| Published |
19.02.2020
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| Subjects | |
| Online Access | Get full text |
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| Abstract | An objective of the present invention is to provide an ion beam apparatus capable of reducing damage to a sample while switching observation and processing in a short time. As a means to solve the objective of the present invention, the ion beam apparatus switches between an operation mode for irradiating an ion beam containing H3+ ions the most and an operation mode for irradiating an ion beam containing ions heavier than the H3+ ions the most.
본 발명은 시료에 대하여 주는 대미지를 경감하는 동시에, 관찰과 가공을 단시간에 전환할 수 있는 이온 빔 장치를 제공하는 것을 과제로 한다. 이러한 과제를 해결하기 위한 수단으로서, 본 발명에 따른 이온 빔 장치는, H3+ 이온을 가장 많이 포함하는 이온 빔을 조사하는 동작 모드와, H3+보다 무거운 이온을 가장 많이 포함하는 이온 빔을 조사하는 동작 모드를 전환한다. |
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| AbstractList | An objective of the present invention is to provide an ion beam apparatus capable of reducing damage to a sample while switching observation and processing in a short time. As a means to solve the objective of the present invention, the ion beam apparatus switches between an operation mode for irradiating an ion beam containing H3+ ions the most and an operation mode for irradiating an ion beam containing ions heavier than the H3+ ions the most.
본 발명은 시료에 대하여 주는 대미지를 경감하는 동시에, 관찰과 가공을 단시간에 전환할 수 있는 이온 빔 장치를 제공하는 것을 과제로 한다. 이러한 과제를 해결하기 위한 수단으로서, 본 발명에 따른 이온 빔 장치는, H3+ 이온을 가장 많이 포함하는 이온 빔을 조사하는 동작 모드와, H3+보다 무거운 이온을 가장 많이 포함하는 이온 빔을 조사하는 동작 모드를 전환한다. |
| Author | SHICHI HIROYASU MATSUBARA SHINICHI KAWANAMI YOSHIMI |
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| RelatedCompanies | HITACHI HIGH-TECH SCIENCE CORPORATION |
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| Snippet | An objective of the present invention is to provide an ion beam apparatus capable of reducing damage to a sample while switching observation and processing in... |
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| Title | ION BEAM APPARATUS |
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