ION BEAM APPARATUS

An objective of the present invention is to provide an ion beam apparatus capable of reducing damage to a sample while switching observation and processing in a short time. As a means to solve the objective of the present invention, the ion beam apparatus switches between an operation mode for irrad...

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Bibliographic Details
Main Authors SHICHI HIROYASU, MATSUBARA SHINICHI, KAWANAMI YOSHIMI
Format Patent
LanguageEnglish
Korean
Published 19.02.2020
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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Summary:An objective of the present invention is to provide an ion beam apparatus capable of reducing damage to a sample while switching observation and processing in a short time. As a means to solve the objective of the present invention, the ion beam apparatus switches between an operation mode for irradiating an ion beam containing H3+ ions the most and an operation mode for irradiating an ion beam containing ions heavier than the H3+ ions the most. 본 발명은 시료에 대하여 주는 대미지를 경감하는 동시에, 관찰과 가공을 단시간에 전환할 수 있는 이온 빔 장치를 제공하는 것을 과제로 한다. 이러한 과제를 해결하기 위한 수단으로서, 본 발명에 따른 이온 빔 장치는, H3+ 이온을 가장 많이 포함하는 이온 빔을 조사하는 동작 모드와, H3+보다 무거운 이온을 가장 많이 포함하는 이온 빔을 조사하는 동작 모드를 전환한다.
Bibliography:Application Number: KR20200010925