SEMICONDUCTOR RESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION
본 기재는, 하기 화학식 1로 표현되는 구조단위를 포함하는 유기금속 화합물 및 용매를 포함하는 반도체 레지스트용 조성물과, 이를 이용한 패턴 형성 방법에 관한 것이다. [화학식 1]화학식 1에 대한 구체적인 내용은 명세서 상에서 정의된 것과 같다. wherein in Chemical Formula 1, carbon bonded with a central metal atom (M) forms a benzylic bond with a ring group having a conjugated structure, such as an arom...
Saved in:
Main Authors | , , , , , |
---|---|
Format | Patent |
Language | English Korean |
Published |
10.02.2020
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Abstract | 본 기재는, 하기 화학식 1로 표현되는 구조단위를 포함하는 유기금속 화합물 및 용매를 포함하는 반도체 레지스트용 조성물과, 이를 이용한 패턴 형성 방법에 관한 것이다. [화학식 1]화학식 1에 대한 구체적인 내용은 명세서 상에서 정의된 것과 같다.
wherein in Chemical Formula 1, carbon bonded with a central metal atom (M) forms a benzylic bond with a ring group having a conjugated structure, such as an aromatic ring group, a heteroaromatic ring group, or a combination thereof. |
---|---|
AbstractList | 본 기재는, 하기 화학식 1로 표현되는 구조단위를 포함하는 유기금속 화합물 및 용매를 포함하는 반도체 레지스트용 조성물과, 이를 이용한 패턴 형성 방법에 관한 것이다. [화학식 1]화학식 1에 대한 구체적인 내용은 명세서 상에서 정의된 것과 같다.
wherein in Chemical Formula 1, carbon bonded with a central metal atom (M) forms a benzylic bond with a ring group having a conjugated structure, such as an aromatic ring group, a heteroaromatic ring group, or a combination thereof. |
Author | CHAE, SEUNG YONG CHEON, HWAN SUNG NA, YOONG HEE NAMGUNG, RAN MOON, KYUNG SOO KIM, JAE HYUN |
Author_xml | – fullname: NA, YOONG HEE – fullname: MOON, KYUNG SOO – fullname: CHEON, HWAN SUNG – fullname: NAMGUNG, RAN – fullname: KIM, JAE HYUN – fullname: CHAE, SEUNG YONG |
BookMark | eNqNizsKAjEUAFNo4e8OD6yFGPcCIR8TJHlL8lIvi8RKsgvr_RHBwtJqGJjZslWbWt2wkk3wCqMuijBBMtlnAoWhx-zJYwQZNQRDDjWgBYsp-HiFXhKZFDOU_FFy5nfas_VjfC718OWOHa0h5U51noa6zOO9tvoabklwwTk_d7wT8vJf9QalUTNo |
ContentType | Patent |
DBID | EVB |
DatabaseName | esp@cenet |
DatabaseTitleList | |
Database_xml | – sequence: 1 dbid: EVB name: esp@cenet url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP sourceTypes: Open Access Repository |
DeliveryMethod | fulltext_linktorsrc |
Discipline | Medicine Chemistry Sciences Physics |
DocumentTitleAlternate | 반도체 레지스트용 조성물 및 이를 이용한 패턴 형성 방법 |
ExternalDocumentID | KR20200014042A |
GroupedDBID | EVB |
ID | FETCH-epo_espacenet_KR20200014042A3 |
IEDL.DBID | EVB |
IngestDate | Fri Jul 19 15:57:52 EDT 2024 |
IsOpenAccess | true |
IsPeerReviewed | false |
IsScholarly | false |
Language | English Korean |
LinkModel | DirectLink |
MergedId | FETCHMERGED-epo_espacenet_KR20200014042A3 |
Notes | Application Number: KR20180089412 |
OpenAccessLink | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200210&DB=EPODOC&CC=KR&NR=20200014042A |
ParticipantIDs | epo_espacenet_KR20200014042A |
PublicationCentury | 2000 |
PublicationDate | 20200210 |
PublicationDateYYYYMMDD | 2020-02-10 |
PublicationDate_xml | – month: 02 year: 2020 text: 20200210 day: 10 |
PublicationDecade | 2020 |
PublicationYear | 2020 |
RelatedCompanies | SAMSUNG SDI CO., LTD |
RelatedCompanies_xml | – name: SAMSUNG SDI CO., LTD |
Score | 3.2297542 |
Snippet | 본 기재는, 하기 화학식 1로 표현되는 구조단위를 포함하는 유기금속 화합물 및 용매를 포함하는 반도체 레지스트용 조성물과, 이를 이용한 패턴 형성 방법에 관한 것이다. [화학식 1]화학식 1에 대한 구체적인 내용은 명세서 상에서 정의된 것과 같다.
wherein in Chemical... |
SourceID | epo |
SourceType | Open Access Repository |
SubjectTerms | ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
Title | SEMICONDUCTOR RESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION |
URI | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200210&DB=EPODOC&locale=&CC=KR&NR=20200014042A |
hasFullText | 1 |
inHoldings | 1 |
isFullTextHit | |
isPrint | |
link | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV3dS8MwED_m_HzT6fBjSkDpW7HtutY9DNmSdp2jTWkz2dtoQwuibMNV_PdN4qZ7GuQldyQkB5fLXe5-AXjgrvVUlI6h59zs6rZV2nrWdkxdGPPMsrlopixwDiMnmNgv0860Bh-bWhiFE_qtwBGFRnGh75U6r5f_QSyicitXj_mbIC2efdYj2to7VhkHhkYGPS-mhGIN49440aLkl6ewZKz-HuzLi7RE2vdeB7IuZbltVPxTOIjFfPPqDGrviwYc483faw04CtdP3g04VDmafCWIaz1cncMkleKjEZlgRhMkpDhKGcI0jGk6kkEn1I8ICj0WUIKoj4SrF46iIYr7TCLgpkj-tjFELPC2B13Ave8xHOhipbM_wczGyfa22k2ozxfz4hJQaZS8FL6nY-Zdu7SdrDDcQrpWDs86vOteQWvXTNe72TdwIrsyd9k0WlCvPr-KW2Gaq_xOSfQHBsCJ7Q |
link.rule.ids | 230,309,786,891,25594,76903 |
linkProvider | European Patent Office |
linkToHtml | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV3dS8MwED_m_JhvOhU_pgaUvhXbrmvdw5CZtmvd2pQ2k72NNrQgyjZcxX_fJG66p0Ge7siRHFyO3-U-AO6ZbTwWpaWpOdO7qmmUppq1LV3lzjwzTMaXLgqcw8jyx-bLpDOpwce6Fkb2Cf2WzRG5RTFu75V8rxf_QSxH5lYuH_I3Tpo_ebTnKCt0LDMONMV57rkxcQhWMO4NEyVKfnmyl4zR34Fdm4NCCZZen0VdymLTqXhHsBdzebPqGGrv8yY08Hr2WhMOwtWXdxP2ZY4mW3Liyg6XJzBOhfpI5IwxJQniWgxSijAJY5IGIuiE-pGDQpf6xEHEQxzqhUE0QHGfig64KRLTNgaI-u7mplO481yKfZWfdPqnmOkw2bxW-wzqs_msOAdUaiUrOfa09LxrlqaVFZpdCGhlsazDuvYFtLZJutzOvoWGT8PRdBREwys4FCyRx6xrLahXn1_FNXfTVX4jtfsDn36M1w |
openUrl | ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=SEMICONDUCTOR+RESIST+COMPOSITION+AND+METHOD+OF+FORMING+PATTERNS+USING+THE+COMPOSITION&rft.inventor=NA%2C+YOONG+HEE&rft.inventor=MOON%2C+KYUNG+SOO&rft.inventor=CHEON%2C+HWAN+SUNG&rft.inventor=NAMGUNG%2C+RAN&rft.inventor=KIM%2C+JAE+HYUN&rft.inventor=CHAE%2C+SEUNG+YONG&rft.date=2020-02-10&rft.externalDBID=A&rft.externalDocID=KR20200014042A |