Substrate Support Mechanism And Substrate Cleaning Device Including The Same

A substrate support mechanism includes: a support member on which a substrate is loaded; a rotating machine rotating the support member; and a vibrator vibrating the substrate in a direction substantially vertical to the substrate, wherein the substrate vibrates in accordance with the natural freque...

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Bibliographic Details
Main Authors KIM BYUNG GOOK, LIM KYEONG BIN, OH JONG KEUN
Format Patent
LanguageEnglish
Korean
Published 24.07.2019
Subjects
BASIC ELECTRIC ELEMENTS
CLEANING
CLEANING IN GENERAL
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PERFORMING OPERATIONS
PREVENTION OF FOULING IN GENERAL
SEMICONDUCTOR DEVICES
TRANSPORTING
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Summary:A substrate support mechanism includes: a support member on which a substrate is loaded; a rotating machine rotating the support member; and a vibrator vibrating the substrate in a direction substantially vertical to the substrate, wherein the substrate vibrates in accordance with the natural frequency of the substrate or vibrates in accordance with the natural frequency of particles on the substrate. 기판 지지 기구는, 기판이 적재되는 지지 부재; 상기 지지 부재를 회전시키는 회전기; 및 상기 기판을 상기 기판에 실질적으로 수직하는 방향으로 진동시키는 진동기를 포함하며, 상기 기판은, 상기 기판의 고유 진동수(Natural frequency)에 따라 진동하거나, 상기 기판 상의 파티클의 고유 진동수에 따라 진동한다.
Bibliography:Application Number: KR20180004921