리소그래피 방법

• Main Authors: JEUNINK ANDRE BERNARDUS, HUANG YANG SHAN, MOEST BEARRACH, VAN DER MEULEN STAN HENRICUS, TOLSMA HOITE PIETER THEODOOR, VAN DEN BRINK ENNO, SCHOUTEN CHRISTINE HENRIETTE, VAN BOKHOVEN LAURENTIUS JOHANNES ADRIANUS, LA TORRE FEDERICO, KEIJ STEFAN CAROLUS JACOBUS ANTONIUS
• Format: Patent
• Language: Korean
• Published: 27.03.2019
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

리소그래피 장치는 방사선 빔의 횡단면에 패턴을 부여하여 패터닝된 방사선 빔을 형성할 수 있는 패터닝 장치 및 관련된 펠리클을 지지하도록 구성된 지지 구조체; 및 기판의 타겟 부분 상으로 패터닝된 방사선 빔을 투영하도록 구성된 투영 시스템을 포함하며, 지지 구조체는 하우징 내에 위치되어 있고, 압력 센서는 하우징 내에 위치되어 있다. A lithographic apparatus comprising a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.