MICROLITHOGRAPHY PROJECTION OBJECTIVE

• Main Authors: GRUNER TORALF, DODOC AURELIAN, PERRIN JEAN CLAUDE, EPPLE ALEXANDER, KAMENOV VLADIMIR, KRAEHMER DANIEL, KALLER JULIAN, OKON THOMAS, FELDMANN HEIKO, CONRADI OLAF
• Format: Patent
• Language: English; Korean
• Published: 22.08.2018
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

물체면(object plane)에 배열된 패턴(pattern)을 이미지면(image plane)에 결상하기 위한 마이크로리소그래피 투영 대물 렌즈가 그러한 투영 대물 렌즈 내의 오류광 억제와 관련하여 기술된다. Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection...