규소 함유 수지 조성물

• Main Authors: NODA KUNIHIRO, CHISAKA HIROKI, KUROKO MAYUMI, SHIOTA DAI
• Format: Patent
• Language: Korean
• Published: 14.03.2018
• Subjects: ADHESIVES; CHEMICAL PAINT OR INK REMOVERS; CHEMISTRY; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS; COMPOSITIONS BASED THEREON; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS; CORRECTING FLUIDS; DYES; FILLING PASTES; INKS; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; ORGANIC MACROMOLECULAR COMPOUNDS; PAINTS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; POLISHES; THEIR PREPARATION OR CHEMICAL WORKING-UP; USE OF MATERIALS THEREFOR; WOODSTAINS

크랙의 발생이 억제된 실리카계 피막을 형성할 수 있는 규소 함유 수지 조성물과, 상기 규소 함유 수지 조성물을 이용하는 실리카계 피막의 형성 방법과, 상기 규소 함유 수지 조성물을 이용해 형성된 크랙이 없는 실리카계 피막을 제공한다. (A) 규소 함유 수지와, (S) 용제를 포함하는 규소 함유 수지 조성물에서, (A) 규소 함유 수지로서, 실록산 수지, 및 폴리실란으로부터 선택되는 1종 이상을 이용해 특정한 구조의 시클로알킬아세테이트를 (S) 용제에 함유시킨다. 시클로알킬아세테이트로서는 시클로헥실아세테이트가 적합하게 사용된다. Provided are a silicon-containing resin composition with which it is possible to form a silica-based coating film in which generation of cracks is minimized, a method for forming a silica-based coating film using the silicon-containing resin composition, and a crack-free silica-based coating film formed using the silicon-containing resin composition. A silicon-containing resin composition including (A) a silicon-containing resin and (S) a solvent, wherein one or more selected from siloxane resins and polysilanes is used as the (A) silicon-containing resin, and the (S) solvent contains a cycloalkyl acetate having a specific structure. Cyclohexyl acetate is preferably used as the cycloalkyl acetate.