POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION FOR MICRO LENS PATTERN PRODUCTION AND APPLICATION THEREOF

• Main Authors: ISOBE SHINGO, MATSUMOTO NAOZUMI, IKEDA YURI, GONSUI SHINOBU, INOUE TOMOYUKI
• Format: Patent
• Language: English; Korean
• Published: 30.01.2018
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

Provided are a photosensitive resin composition which is suitable for efficiently performing an industrial process in the formation of a micro lens that is capable of coping with a variety of exposure conditions, and a use of the photosensitive resin composition. The photosensitive resin composition...