POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION FOR MICRO LENS PATTERN PRODUCTION AND APPLICATION THEREOF

Provided are a photosensitive resin composition which is suitable for efficiently performing an industrial process in the formation of a micro lens that is capable of coping with a variety of exposure conditions, and a use of the photosensitive resin composition. The photosensitive resin composition...

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Main Authors ISOBE SHINGO, MATSUMOTO NAOZUMI, IKEDA YURI, GONSUI SHINOBU, INOUE TOMOYUKI
Format Patent
LanguageEnglish
Korean
Published 30.01.2018
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Abstract Provided are a photosensitive resin composition which is suitable for efficiently performing an industrial process in the formation of a micro lens that is capable of coping with a variety of exposure conditions, and a use of the photosensitive resin composition. The photosensitive resin composition according to the present invention is a positive-type photosensitive resin composition for micro lens pattern production containing a resin (A) which has an acid dissociable dissolution inhibiting group and increases solubility to alkali by the action of acid, a compound (B) including a functional group that is crosslinked to the resin (A), and a photoacid generator (C), wherein the photoacid generator (C) has 0.6 or more of absorbance at a wavelength of 365 nm, 0.75 or more of absorbance at a wavelength of 248 nm, and the absorbance is measured at the following condition. The condition is that absorbance of a propyleneglycol monomethyl ether solution of the photoacid generator (C) having a weight mole concentration of 8.1810^-5 mol/kg is measured under conditions including the temperature of 23C and an optical path length of 10 mm. [과제] 각종 노광 조건에 대응 가능한, 마이크로 렌즈 형성에서의 공업 프로세스를 효율화하기에 적절한 감광성 수지 조성물과 그의 용도를 제공하는 것. [해결 수단] 본 발명에 따른 마이크로 렌즈 패턴 제조용 포지티브형 감광성 수지 조성물은 산해리성 용해 억제기를 갖고 산의 작용에 의해 알칼리에 대한 용해성이 증대하는 수지(A)와, 상기 수지(A)를 가교하는 관능기를 구비하는 화합물(B)과, 광산발생제(C)를 함유하는 마이크로 렌즈 패턴 제조용 포지티브형 감광성 수지 조성물로서, 상기 광산발생제(C)는 파장 365 nm에서의 흡광도가 0.6 이상이고, 또한 파장 248 nm에서의 흡광도가 0.75 이상이며, 상기 흡광도가 이하의 조건에서 측정되는 것을 특징으로 한다. (조건) 중량 몰 농도가 8.18×10㏖/㎏인 상기 광산발생제(C)의 프로필렌글리콜 모노메틸 에테르 용액의 흡광도를 온도 23℃, 광로 길이 10 ㎜의 조건 하에서 측정한다.
AbstractList Provided are a photosensitive resin composition which is suitable for efficiently performing an industrial process in the formation of a micro lens that is capable of coping with a variety of exposure conditions, and a use of the photosensitive resin composition. The photosensitive resin composition according to the present invention is a positive-type photosensitive resin composition for micro lens pattern production containing a resin (A) which has an acid dissociable dissolution inhibiting group and increases solubility to alkali by the action of acid, a compound (B) including a functional group that is crosslinked to the resin (A), and a photoacid generator (C), wherein the photoacid generator (C) has 0.6 or more of absorbance at a wavelength of 365 nm, 0.75 or more of absorbance at a wavelength of 248 nm, and the absorbance is measured at the following condition. The condition is that absorbance of a propyleneglycol monomethyl ether solution of the photoacid generator (C) having a weight mole concentration of 8.1810^-5 mol/kg is measured under conditions including the temperature of 23C and an optical path length of 10 mm. [과제] 각종 노광 조건에 대응 가능한, 마이크로 렌즈 형성에서의 공업 프로세스를 효율화하기에 적절한 감광성 수지 조성물과 그의 용도를 제공하는 것. [해결 수단] 본 발명에 따른 마이크로 렌즈 패턴 제조용 포지티브형 감광성 수지 조성물은 산해리성 용해 억제기를 갖고 산의 작용에 의해 알칼리에 대한 용해성이 증대하는 수지(A)와, 상기 수지(A)를 가교하는 관능기를 구비하는 화합물(B)과, 광산발생제(C)를 함유하는 마이크로 렌즈 패턴 제조용 포지티브형 감광성 수지 조성물로서, 상기 광산발생제(C)는 파장 365 nm에서의 흡광도가 0.6 이상이고, 또한 파장 248 nm에서의 흡광도가 0.75 이상이며, 상기 흡광도가 이하의 조건에서 측정되는 것을 특징으로 한다. (조건) 중량 몰 농도가 8.18×10㏖/㎏인 상기 광산발생제(C)의 프로필렌글리콜 모노메틸 에테르 용액의 흡광도를 온도 23℃, 광로 길이 10 ㎜의 조건 하에서 측정한다.
Author INOUE TOMOYUKI
GONSUI SHINOBU
ISOBE SHINGO
IKEDA YURI
MATSUMOTO NAOZUMI
Author_xml – fullname: ISOBE SHINGO
– fullname: MATSUMOTO NAOZUMI
– fullname: IKEDA YURI
– fullname: GONSUI SHINOBU
– fullname: INOUE TOMOYUKI
BookMark eNqNyrsKwkAQheEttPD2DgPWgY1a2C6bCVmMO8tkFKxCkBULSQLx_VESH8Dq8B--pZq1XRsX6hmocuKumMgtIISChCr00weMlfNg6Twp8pATw9lZJii_CoIRQfYQmLKLHYXxGZgQSmfN2FIgI-VrNX80ryFufrtS2xzFFknsuzoOfXOPbXzXJ97p9Kh1qtODNvv_1Afgrjjy
ContentType Patent
DBID EVB
DatabaseName esp@cenet
DatabaseTitleList
Database_xml – sequence: 1
  dbid: EVB
  name: esp@cenet
  url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP
  sourceTypes: Open Access Repository
DeliveryMethod fulltext_linktorsrc
Discipline Medicine
Chemistry
Sciences
Physics
DocumentTitleAlternate 마이크로 렌즈 패턴 제조용 포지티브형 감광성 수지 조성물 및 그의 용도
ExternalDocumentID KR20180010140A
GroupedDBID EVB
ID FETCH-epo_espacenet_KR20180010140A3
IEDL.DBID EVB
IngestDate Fri Jul 19 15:20:53 EDT 2024
IsOpenAccess true
IsPeerReviewed false
IsScholarly false
Language English
Korean
LinkModel DirectLink
MergedId FETCHMERGED-epo_espacenet_KR20180010140A3
Notes Application Number: KR20170088528
OpenAccessLink https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180130&DB=EPODOC&CC=KR&NR=20180010140A
ParticipantIDs epo_espacenet_KR20180010140A
PublicationCentury 2000
PublicationDate 20180130
PublicationDateYYYYMMDD 2018-01-30
PublicationDate_xml – month: 01
  year: 2018
  text: 20180130
  day: 30
PublicationDecade 2010
PublicationYear 2018
RelatedCompanies TOKYO OHKA KOGYO CO., LTD
RelatedCompanies_xml – name: TOKYO OHKA KOGYO CO., LTD
Score 3.0879624
Snippet Provided are a photosensitive resin composition which is suitable for efficiently performing an industrial process in the formation of a micro lens that is...
SourceID epo
SourceType Open Access Repository
SubjectTerms APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
Title POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION FOR MICRO LENS PATTERN PRODUCTION AND APPLICATION THEREOF
URI https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180130&DB=EPODOC&locale=&CC=KR&NR=20180010140A
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV3dT8IwEL8gfr4pavxA00Szt0VkG2wPxIytyxBZmzEIPpF9lGg0QGTGf99bAeWJx14vzfWSX6_X3gfAvSFSI8uamZqI2FB1lFU1jSxVYzT1zVjT8EpfJDj3goY_0J9HxqgEn-tcGFkn9EcWR0REpYj3XJ7X8_9HLFfGVi4eknckzZ68qOUqK-_40Sw-4hS33aKcucxRHKfVDZUgXM7JxrQ1ewd28SLdLPBAh-0iL2W-aVS8Y9jjuN40P4HSx6wCh86691oFDnqrL-8K7MsYzXSBxBUOF6fwxlm_E3WGVI1eOSXcZxHr02BJI6jUTkAc1ltysYCgq0dQ3yEjL8hFuB0VhXAJD5k7kFEkxA5cYnO-TiwmkU9DyrwzuPNo5PgqCj_-09W4G27uVDuH8nQ2FRdANMMSNaFZqWUKPc4mCLeJWRepleiikRnaJVS3rXS1ffoajoph8Tah1apQzr--xQ1a6zy5lUr-BREwkNE
link.rule.ids 230,309,783,888,25576,76876
linkProvider European Patent Office
linkToHtml http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV3dT8IwEL8gfuCbosYP1CaavS2i22B7IGZsXTZhazMKwScythKNBojM-O_bFVCeeL27XNpLfr229wVwb_DUyLJmpo55Yqi6WKtqGlmqJsLVNxNNE1f6osA5jBp-X38ZGsMSfK5rYWSf0B_ZHFEgKhV4z-V5Pf__xHJlbuXiYfwuSLNnj7VcZfU6fjSLQJzitluYEpc4iuO0OrESxUueHExbt3dgV1yymwUe8KBd1KXMN52KdwR7VOib5sdQ-phVoeKsZ69V4SBchbyrsC9zNNOFIK5wuDiBN0p6AQsGWGWvFCPqE0Z6OFrSkDBqECGHhEspEiHx1EPC3jFBXSGFqM2KRriIxsTtyywSZEcusildFxYj5uMYE-8U7jzMHF8Vix_92WrUiTd3qp1BeTqb8nNAmmHxOtes1DK5nmQTAbeJ-cRTa6zzRmZoF1DbpulyO_sWKj4Lu6NuEHWu4LBgFf8UWr0G5fzrm18Lz52Pb6TBfwEJjJPE
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=POSITIVE-TYPE+PHOTOSENSITIVE+RESIN+COMPOSITION+FOR+MICRO+LENS+PATTERN+PRODUCTION+AND+APPLICATION+THEREOF&rft.inventor=ISOBE+SHINGO&rft.inventor=MATSUMOTO+NAOZUMI&rft.inventor=IKEDA+YURI&rft.inventor=GONSUI+SHINOBU&rft.inventor=INOUE+TOMOYUKI&rft.date=2018-01-30&rft.externalDBID=A&rft.externalDocID=KR20180010140A