POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION FOR MICRO LENS PATTERN PRODUCTION AND APPLICATION THEREOF
Provided are a photosensitive resin composition which is suitable for efficiently performing an industrial process in the formation of a micro lens that is capable of coping with a variety of exposure conditions, and a use of the photosensitive resin composition. The photosensitive resin composition...
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Language | English Korean |
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30.01.2018
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Abstract | Provided are a photosensitive resin composition which is suitable for efficiently performing an industrial process in the formation of a micro lens that is capable of coping with a variety of exposure conditions, and a use of the photosensitive resin composition. The photosensitive resin composition according to the present invention is a positive-type photosensitive resin composition for micro lens pattern production containing a resin (A) which has an acid dissociable dissolution inhibiting group and increases solubility to alkali by the action of acid, a compound (B) including a functional group that is crosslinked to the resin (A), and a photoacid generator (C), wherein the photoacid generator (C) has 0.6 or more of absorbance at a wavelength of 365 nm, 0.75 or more of absorbance at a wavelength of 248 nm, and the absorbance is measured at the following condition. The condition is that absorbance of a propyleneglycol monomethyl ether solution of the photoacid generator (C) having a weight mole concentration of 8.1810^-5 mol/kg is measured under conditions including the temperature of 23C and an optical path length of 10 mm.
[과제] 각종 노광 조건에 대응 가능한, 마이크로 렌즈 형성에서의 공업 프로세스를 효율화하기에 적절한 감광성 수지 조성물과 그의 용도를 제공하는 것. [해결 수단] 본 발명에 따른 마이크로 렌즈 패턴 제조용 포지티브형 감광성 수지 조성물은 산해리성 용해 억제기를 갖고 산의 작용에 의해 알칼리에 대한 용해성이 증대하는 수지(A)와, 상기 수지(A)를 가교하는 관능기를 구비하는 화합물(B)과, 광산발생제(C)를 함유하는 마이크로 렌즈 패턴 제조용 포지티브형 감광성 수지 조성물로서, 상기 광산발생제(C)는 파장 365 nm에서의 흡광도가 0.6 이상이고, 또한 파장 248 nm에서의 흡광도가 0.75 이상이며, 상기 흡광도가 이하의 조건에서 측정되는 것을 특징으로 한다. (조건) 중량 몰 농도가 8.18×10㏖/㎏인 상기 광산발생제(C)의 프로필렌글리콜 모노메틸 에테르 용액의 흡광도를 온도 23℃, 광로 길이 10 ㎜의 조건 하에서 측정한다. |
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AbstractList | Provided are a photosensitive resin composition which is suitable for efficiently performing an industrial process in the formation of a micro lens that is capable of coping with a variety of exposure conditions, and a use of the photosensitive resin composition. The photosensitive resin composition according to the present invention is a positive-type photosensitive resin composition for micro lens pattern production containing a resin (A) which has an acid dissociable dissolution inhibiting group and increases solubility to alkali by the action of acid, a compound (B) including a functional group that is crosslinked to the resin (A), and a photoacid generator (C), wherein the photoacid generator (C) has 0.6 or more of absorbance at a wavelength of 365 nm, 0.75 or more of absorbance at a wavelength of 248 nm, and the absorbance is measured at the following condition. The condition is that absorbance of a propyleneglycol monomethyl ether solution of the photoacid generator (C) having a weight mole concentration of 8.1810^-5 mol/kg is measured under conditions including the temperature of 23C and an optical path length of 10 mm.
[과제] 각종 노광 조건에 대응 가능한, 마이크로 렌즈 형성에서의 공업 프로세스를 효율화하기에 적절한 감광성 수지 조성물과 그의 용도를 제공하는 것. [해결 수단] 본 발명에 따른 마이크로 렌즈 패턴 제조용 포지티브형 감광성 수지 조성물은 산해리성 용해 억제기를 갖고 산의 작용에 의해 알칼리에 대한 용해성이 증대하는 수지(A)와, 상기 수지(A)를 가교하는 관능기를 구비하는 화합물(B)과, 광산발생제(C)를 함유하는 마이크로 렌즈 패턴 제조용 포지티브형 감광성 수지 조성물로서, 상기 광산발생제(C)는 파장 365 nm에서의 흡광도가 0.6 이상이고, 또한 파장 248 nm에서의 흡광도가 0.75 이상이며, 상기 흡광도가 이하의 조건에서 측정되는 것을 특징으로 한다. (조건) 중량 몰 농도가 8.18×10㏖/㎏인 상기 광산발생제(C)의 프로필렌글리콜 모노메틸 에테르 용액의 흡광도를 온도 23℃, 광로 길이 10 ㎜의 조건 하에서 측정한다. |
Author | INOUE TOMOYUKI GONSUI SHINOBU ISOBE SHINGO IKEDA YURI MATSUMOTO NAOZUMI |
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DocumentTitleAlternate | 마이크로 렌즈 패턴 제조용 포지티브형 감광성 수지 조성물 및 그의 용도 |
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RelatedCompanies | TOKYO OHKA KOGYO CO., LTD |
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Snippet | Provided are a photosensitive resin composition which is suitable for efficiently performing an industrial process in the formation of a micro lens that is... |
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SubjectTerms | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
Title | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION FOR MICRO LENS PATTERN PRODUCTION AND APPLICATION THEREOF |
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