METHOD AND APPARATUS FOR REDUCING IN-PROCESS AND IN-USE STICTION FOR MEMS DEVICES
The present invention relates to a method of manufacturing a microelectromechanical system (MEMS) device. A plurality of openings is formed on a first side of a first substrate. A dielectric layer is formed on the first side of the substrate. A plurality of portions of the dielectric layer fill in t...
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Main Authors | , , , |
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Format | Patent |
Language | English Korean |
Published |
12.04.2017
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Subjects | |
Online Access | Get full text |
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