Apparatus for Manufacturing Semiconductor And Method of Operating The Same

• Main Authors: LEE, HO YOUNG, JOH, YONG SANG, JANG, WOOK SANG, JEON, JE HOON, KAM, BYUNG MIN
• Format: Patent
• Language: English; Korean
• Published: 20.03.2017
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

The present invention relates to technology about a semiconductor manufacturing apparatus. The semiconductor manufacturing apparatus according to an embodiment of the present invention includes a susceptor which is rotatably installed in a reaction chamber. A plurality of mounting units receiving wafers are installed on the upper side of the susceptor. A satellite mounting the wafer is formed in each of the plurality of mounting units. A gas delivery line to deliver a rotating gas including an etching gas to the lower sides of the plurality of mounting units is formed in the susceptor. Accordingly, the present invention can improve deposition by uniformity preventing the generation of particles. 반도체 제조 장치에 관한 기술이다. 본 실시예의 반도체 제조 장치는, 반응 챔버내에 회전 가능하게 설치된 서셉터를 포함한다. 서셉터의 상부에 웨이퍼를 수용하는 복수의 재치부가 설치된다. 상기 복수의 재치부 각각에 웨이퍼를 탑재하는 새틀라이트가 구비된다. 상기 복수의 재치부의 저면에 식각 가스를 포함하는 회전 가스를 전달하기 위한 가스 전달 라인이 상기 서셉터 내에 형성된다.