SUBSTRATE PROCESSING METHOD SUBSTRATE PROCESSING APPARATUS AND STORAGE MEDIUM

• Main Authors: OHNO HIROKI, KAWANO HISASHI, GOSHI GENTARO, MITSUOKA KAZUYUKI
• Format: Patent
• Language: English; Korean
• Published: 18.01.2017
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

The purpose of the present invention is to reduce the number of types of fluorine-containing organic solvent to be used during a supercritical process. Disclosed is a substrate processing method in an outer chamber (21) of a liquid treatment unit (2) which comprises the processes of: supplying a flu...