POLYMERIZABLE COMPOSITION PHOTOSENSITIVE COMPOSITION AND CURED PRODUCT OF PHOTOSENSITVE COMPOSITION

• Main Authors: ISHIKAWA TATSURO, SHINOZAKI SHINYA, KUROKO MAYUMI
• Format: Patent
• Language: English; Korean
• Published: 07.11.2016
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; THEIR PREPARATION OR CHEMICAL WORKING-UP

Provided are a polymerizable composition providing a photosensitive composition which can form a pattern having excellent adhesion to a substrate while having excellent straightness with little light exposure, a photosensitive composition comprising the polymerizable composition, and a cured product...