METHOD FOR MANUFACTURING FILM FORMATION MASK AND FILM FORMATION MASK

• Main Author: MIZUMURA MICHINOBU
• Format: Patent
• Language: English; Korean
• Published: 10.10.2016
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; CLADDING OR PLATING BY SOLDERING OR WELDING; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR; METALLURGY; PERFORMING OPERATIONS; SOLDERING OR UNSOLDERING; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TRANSPORTING; WELDING; WORKING BY LASER BEAM

본 발명은 미리 정해진 소정 형상의 개구 패턴(4)을 형성한 수지제의 필름층(1)과, 상기 개구 패턴(4)이 내재할 수 있는 크기의 틈(7)을 형성한 자성 금속 재료층(2)을 적층한 구조의 성막 마스크의 제조 방법에 있어서, 상기 개구 패턴(4)은 상기 틈(7)에 대응한 필름층(1)의 부분에 양면측으로부터 레이저 광을 조사하여, 상기 필름층(2)를 관통시켜 형성되는 것이다. The present invention is a method for manufacturing a film formation mask having a structure in which a resin film layer (1) provided with an opening pattern (4) of a previously determined specified pattern and a magnetic metal material layer (2) provided with spaces (7) of a size that can accommodate the opening pattern (4) are laminated. The opening pattern (4) is formed by irradiating laser light from both surfaces of portions of the film layer (1) corresponding to the spaces (7) to pierce the film layer (2).