SELECTIVE DEPOSITION AND CO-DEPOSITION PROCESSES FOR FERROMAGNETIC THIN FILMS
A method for selectively depositing a ferromagnetic layer on a conducting layer includes: providing a substrate including a conducting layer; preparing a solution including metal salt; adding a complexing agent to the solution; adding a reducing agent to the solution; while a temperature of the solu...
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Language | English Korean |
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13.07.2016
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Abstract | A method for selectively depositing a ferromagnetic layer on a conducting layer includes: providing a substrate including a conducting layer; preparing a solution including metal salt; adding a complexing agent to the solution; adding a reducing agent to the solution; while a temperature of the solution is less than 75 degrees, immersing the substrate in the solution for a predetermined period to deposit a ferromagnetic layer on the conducting layer by electroless deposition, wherein the ferromagnetic layer comprises one among cobalt (Co), iron (Fe) and CoFe; and after the predetermined period, removing the substrate from the solution.
도전층 상에 강자성층을 선택적으로 디포짓하기 위한 방법은, 도전층을 포함하는 기판을 제공하는 단계; 금속 염을 포함하는 용액을 준비하는 단계; 착화제를 용액에 첨가하는 단계; 환원제를 용액에 첨가하는 단계; 용액의 온도가 75미만인 동안, 무전해 디포지션에 의해 도전층 상에 강자성층을 디포짓하기 위해 미리 결정된 기간 동안 기판을 용액에 침지하는 단계로서, 강자성층은 코발트 (Co), 철 (Fe) 또는 CoFe 중 하나를 포함하는, 침지하는 단계; 및 미리 결정된 기간 후에, 용액으로부터 기판을 제거하는 단계를 포함한다. |
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AbstractList | A method for selectively depositing a ferromagnetic layer on a conducting layer includes: providing a substrate including a conducting layer; preparing a solution including metal salt; adding a complexing agent to the solution; adding a reducing agent to the solution; while a temperature of the solution is less than 75 degrees, immersing the substrate in the solution for a predetermined period to deposit a ferromagnetic layer on the conducting layer by electroless deposition, wherein the ferromagnetic layer comprises one among cobalt (Co), iron (Fe) and CoFe; and after the predetermined period, removing the substrate from the solution.
도전층 상에 강자성층을 선택적으로 디포짓하기 위한 방법은, 도전층을 포함하는 기판을 제공하는 단계; 금속 염을 포함하는 용액을 준비하는 단계; 착화제를 용액에 첨가하는 단계; 환원제를 용액에 첨가하는 단계; 용액의 온도가 75미만인 동안, 무전해 디포지션에 의해 도전층 상에 강자성층을 디포짓하기 위해 미리 결정된 기간 동안 기판을 용액에 침지하는 단계로서, 강자성층은 코발트 (Co), 철 (Fe) 또는 CoFe 중 하나를 포함하는, 침지하는 단계; 및 미리 결정된 기간 후에, 용액으로부터 기판을 제거하는 단계를 포함한다. |
Author | DORDI YEZDI ERNEST CHEN ANIRUDDHA JOI |
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DocumentTitleAlternate | 강자성 박막들을 위한 선택적인 디포지션 프로세스 및 공-디포지션 프로세스 |
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Snippet | A method for selectively depositing a ferromagnetic layer on a conducting layer includes: providing a substrate including a conducting layer; preparing a... |
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SubjectTerms | ELECTRICITY |
Title | SELECTIVE DEPOSITION AND CO-DEPOSITION PROCESSES FOR FERROMAGNETIC THIN FILMS |
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