SEMICONDUCTOR DEVICE, METHODS OF FORMING PATTERNS FOR SEMICONDUCTOR DEVICE, AND METHODS OF MANUFACTURING SEMICONDUCTOR DEVICES

• Main Authors: YEO, KYOUNG HWAN, BAI, KEUN HEE, PARK, SEUNG JU, KIM, MYEONG CHEOL, PARK, KI BYUNG, KIM, DO HYOUNG, HA, SEUNG SEOK, KOO, JAE HYOUNG
• Format: Patent
• Language: English; Korean
• Published: 29.06.2016
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

Provided are a semiconductor device with an improved degree of integration, a method for forming a pattern of the semiconductor device, and a method for manufacturing the semiconductor device. According to an embodiment of the present invention, the semiconductor device comprises: a substrate having...