BEAM DELIVERY APPARATUS AND METHOD

• Main Authors: KRUIZINGA BORGERT, KATALENIC ANDELKO, BANINE VADIM, VAN GORKOM RAMON, FRIJNS OLAV, LOOPSTRA ERIK, GRIMMINCK LEONARDUS, NIENHUYS HAN KWANG, BARTRAIJ PETRUS, AMENT LUCAS, NIKIPELOV ANDREY, DONKER RILPHO, DE VRIES GOSSE, DE JAGER PIETER, RENKENS MICHAEL, ENGELEN WOUTER, JANSSEN FRANCISCUS
• Format: Patent
• Language: English; Korean
• Published: 03.06.2016
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

리소그래피 시스템 내에서 사용되는 전달 시스템이 개시된다. 빔 전달 시스템은 방사선 소스로부터 방사선 빔을 수용하고 1 이상의 방향들을 따라 방사선의 부분들을 반사하여 1 이상의 툴로의 제공을 위한 1 이상의 브랜치 방사선 빔을 형성하도록 배치되는 광학 요소들을 포함한다. A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.