HIGH PURITY NICKEL MOLDS FOR OPTICAL QUALITY GLASS FORMING AND METHOD OF SHAPING A GLASS SHEET USING SAID MOLDS

• Main Authors: HORN KRISTEN MARIE, WANG WENCHAO, LINEMAN DAVID MYRON, MORRIS KEVIN THOMAS
• Format: Patent
• Language: English; Korean
• Published: 07.10.2015
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION ORPROCESSING OF GOODS; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GLASS; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES; METALLURGY; MINERAL OR SLAG WOOL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS; TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINSTCLIMATE CHANGE

본 발명은 3차원 유리 기판 형성에 사용되는 고순도 니켈 몰드 및 3차원 유리 기판을 제조하는 방법에 관한 것이다. 상기 고순도 몰드는 상기 성형 표면 상에 니켈 산화물층을 포함하며, 상기 니켈 산화물층은 약 200nm 내지 약 20마이크론의 두께를 갖는다. 상기 몰드 조성은 전자 적용에의 사용을 위한 광학 품질의 성형 유리 제품을 제공하면서 형성된 유리 기판 내의 결함을 최소화한다....