DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF
A display device according to an embodiment of the present invention includes: a first insulating substrate; a gate line located on the first insulating substrate; a semiconductor layer located on the gate line; a drain electrode which is insulated from and intersects with the gate line and is space...
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Main Authors | , , , , |
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Format | Patent |
Language | English Korean |
Published |
02.10.2015
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Abstract | A display device according to an embodiment of the present invention includes: a first insulating substrate; a gate line located on the first insulating substrate; a semiconductor layer located on the gate line; a drain electrode which is insulated from and intersects with the gate line and is spaced apart from and face a data line including a source electrode and the source electrode; a first insulating layer located on the source electrode and the drain electrode; a pixel electrode electrically connected to the drain electrode; a second insulating layer located on the pixel electrode; a common electrode located on the second insulating layer; and an obstruction pattern part located in the same layer as the pixel electrode and overlapping the data line.
본 발명의 일 실시예에 따른 표시 장치는 제1 절연 기판, 상기 제1 절연 기판 위에 위치하는 게이트선, 상기 게이트선 위에 위치하는 반도체층, 상기 게이트선과 절연되어 교차하며, 소스 전극을 포함하는 데이터선 및 상기 소스 전극과 이격되어 마주하는 드레인 전극, 상기 소스 전극 및 상기 드레인 전극 위에 위치하는 제1 절연막, 상기 드레인 전극과 전기적으로 연결되는 화소 전극, 상기 화소 전극 위에 위치하는 제2 절연막, 상기 제2 절연막 위에 위치하는 공통 전극, 및 상기 화소 전극과 동일한 층에 위치하며, 상기 데이터선과 중첩하는 차단 패턴부를 포함한다. |
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AbstractList | A display device according to an embodiment of the present invention includes: a first insulating substrate; a gate line located on the first insulating substrate; a semiconductor layer located on the gate line; a drain electrode which is insulated from and intersects with the gate line and is spaced apart from and face a data line including a source electrode and the source electrode; a first insulating layer located on the source electrode and the drain electrode; a pixel electrode electrically connected to the drain electrode; a second insulating layer located on the pixel electrode; a common electrode located on the second insulating layer; and an obstruction pattern part located in the same layer as the pixel electrode and overlapping the data line.
본 발명의 일 실시예에 따른 표시 장치는 제1 절연 기판, 상기 제1 절연 기판 위에 위치하는 게이트선, 상기 게이트선 위에 위치하는 반도체층, 상기 게이트선과 절연되어 교차하며, 소스 전극을 포함하는 데이터선 및 상기 소스 전극과 이격되어 마주하는 드레인 전극, 상기 소스 전극 및 상기 드레인 전극 위에 위치하는 제1 절연막, 상기 드레인 전극과 전기적으로 연결되는 화소 전극, 상기 화소 전극 위에 위치하는 제2 절연막, 상기 제2 절연막 위에 위치하는 공통 전극, 및 상기 화소 전극과 동일한 층에 위치하며, 상기 데이터선과 중첩하는 차단 패턴부를 포함한다. |
Author | BAEK, JU HYEON CHOI, KYUNG SEOB KIM, SEUL KI JEONG, JI YOUNG LEE, BONG JUN |
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RelatedCompanies | SAMSUNG DISPLAY CO., LTD |
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Snippet | A display device according to an embodiment of the present invention includes: a first insulating substrate; a gate line located on the first insulating... |
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SubjectTerms | DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING FREQUENCY-CHANGING NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS PHYSICS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF |
Title | DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF |
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