UNIT FOR GENERATING PLASMA AND APPARATUS AND METHOD FOR TREATING SUBSTRATE INCLUDING THE SAME

• Main Authors: EMMA DANIELYAN, PARK, SEUNG JIN, HARUTYUN MELIKYAN, LEE, SOO JIN, KOO, IL GYO, SEONG, HYO SEONG
• Format: Patent
• Language: English; Korean
• Published: 12.08.2015
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS; SEMICONDUCTOR DEVICES

The present invention relates to a device to process a substrate and a method thereof and, more specifically, to a device to process the substrate by using plasma and a method thereof. A substrate processing device according to an embodiment of the present invention comprises: a chamber to provide a processing space in which a process is performed; a substrate supporting unit to be provided to support the substrate in the processing space; and a plasma generation unit to generate the plasma from processing gas which is provided to the processing space. The plasma generation unit comprises: an antenna member to be provided on the upper side of the chamber; a control pad located on the upper side of the antenna member; and a driving member to move the control pad upward and downward. The control pad is provided by being folded.