PHOTOSENSITIVE RESIN COMPOSITION AND LIGHT BLOCKING LAYER USING THE SAME

• Main Authors: AHN, KYUNG WON, LEE, CHANG MIN, YU, A RUM, CHOI, HYUN MOO, KIM, JI HYE
• Format: Patent
• Language: English; Korean
• Published: 17.06.2015
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTROGRAPHY; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; TECHNICAL SUBJECTS COVERED BY FORMER USPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ARTCOLLECTIONS [XRACs] AND DIGESTS; THEIR PREPARATION OR CHEMICAL WORKING-UP

Provided are a photosensitive resin composition including (A) a cardo-based resin including a repeating unit presented by chemical formula 2; (B) a reactive unsaturated compound; (C) a pigment; (D) an initiator; and (E) a solvent, a light blocking layer using the same, and a color filter. (Here, each substituent is the same as defined in the specification.) (A) 하기 화학식 1로 표시되는 반복단위를 포함하는 카도계 수지; (B) 반응성 불포화 화합물; (C) 안료; (D) 개시제; 및 (E) 용매를 포함하는 감광성 수지 조성물, 이를 이용한 차광층 및 컬러필터가 제공된다. [화학식 1](상기 화학식 1에서, 각 치환기는 명세서에 정의된 바와 같다.)