SILICON HARDMASK LAYER FOR DIRECTED SELF-ASSEMBLY

• Main Authors: HOCKEY MARY ANN, GUERRERO DOUGLAS J, COX ROBERT C, KRISHNAMURTHY VANDANA, WANG YUBAO
• Format: Patent
• Language: English; Korean
• Published: 21.01.2015
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

Compositions for directed self-assembly patterning techniques are provided which avoid the need for separate anti-reflective coatings and brush neutral layers in the process. Methods for directed self-assembly are also provided in which a self-assembling material, such as a directed self-assembly bl...