SPUTTERING TARGET, AND HIGH-RESISTANCE TRANSPARENT FILM AND METHOD FOR PRODUCTION THEREOF
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| Main Authors | , , , |
|---|---|
| Format | Patent |
| Language | English Korean |
| Published |
04.12.2014
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| Subjects | |
| Online Access | Get full text |
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| Author | ZHANG SHOUBIN KONDOU YUICHI YAMAGUCHI GOU MORI RIE |
|---|---|
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| SubjectTerms | ARTIFICIAL STONE CEMENTS CERAMICS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS CONCRETE DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LIME, MAGNESIA MANUFACTURE OR TREATMENT OF NANOSTRUCTURES MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES METALLURGY NANOTECHNOLOGY PERFORMING OPERATIONS REFRACTORIES SLAG SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING TREATMENT OF NATURAL STONE |
| Title | SPUTTERING TARGET, AND HIGH-RESISTANCE TRANSPARENT FILM AND METHOD FOR PRODUCTION THEREOF |
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