SILICON ON INSULATOR ETCH

• Main Authors: ROBSON MARK TODHUNTER, BOWERS JAMES R, AUDREY CHARLES, LI SIYI, HEFTY ROBERT
• Format: Patent
• Language: English; Korean
• Published: 01.09.2014
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

A method etching features through a stack of a silicon nitride layer over a silicon layer over a silicon oxide layer in a plasma processing chamber is provided. The silicon nitride layer is etched in the plasma processing chamber, comprising; flowing a silicon nitride etch gas; forming the silicon n...