REFLECTIVE OPTICAL ELEMENT FOR THE EUV WAVELENGTH RANGE, METHOD FOR PRODUCING AND FOR CORRECTING SUCH AN ELEMENT, PROJECTION LENS FOR MICROLITHOGRAPHY COMPRISING SUCH AN ELEMENT, AND PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY COMPRISING SUCH A PROJECTION LENS
A reflective optical element 39 for EUV wavelengths having a layer arrangement on the surface of a substrate, wherein the layer arrangement includes at least one layer subsystem 37 consisting of a periodic sequence of at least one period of individual layers. The period includes two individual layer...
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Main Authors | , , , , , , |
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Format | Patent |
Language | English Korean |
Published |
04.07.2014
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Subjects | |
Online Access | Get full text |
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