PATTERN FORMATION METHOD AND POLYMER ALLOY BASE MATERIAL
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Main Authors | , , , , , , |
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Format | Patent |
Language | English Korean |
Published |
27.05.2013
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Subjects | |
Online Access | Get full text |
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Author | KITAGAWA RYOTA SEINO YURIKO HATTORI SHIGEKI ASAKAWA KOJI KANNO MASAHIRO HIGA MOMOKA NAKAMURA HIROKO |
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SubjectTerms | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MANUFACTURE OR TREATMENT OF NANOSTRUCTURES MATERIALS THEREFOR MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES MICROSTRUCTURAL TECHNOLOGY NANOTECHNOLOGY ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS SEMICONDUCTOR DEVICES SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES TRANSPORTING |
Title | PATTERN FORMATION METHOD AND POLYMER ALLOY BASE MATERIAL |
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