PATTERN FORMATION METHOD AND POLYMER ALLOY BASE MATERIAL

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Main Authors ASAKAWA KOJI, KITAGAWA RYOTA, HATTORI SHIGEKI, KANNO MASAHIRO, SEINO YURIKO, NAKAMURA HIROKO, HIGA MOMOKA
Format Patent
LanguageEnglish
Korean
Published 27.05.2013
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
MATERIALS THEREFOR
MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES
MICROSTRUCTURAL TECHNOLOGY
NANOTECHNOLOGY
ORIGINALS THEREFOR
PERFORMING OPERATIONS
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
SEMICONDUCTOR DEVICES
SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
TRANSPORTING
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Author KITAGAWA RYOTA
SEINO YURIKO
HATTORI SHIGEKI
ASAKAWA KOJI
KANNO MASAHIRO
HIGA MOMOKA
NAKAMURA HIROKO
Author_xml – fullname: ASAKAWA KOJI
– fullname: KITAGAWA RYOTA
– fullname: HATTORI SHIGEKI
– fullname: KANNO MASAHIRO
– fullname: SEINO YURIKO
– fullname: NAKAMURA HIROKO
– fullname: HIGA MOMOKA
BookMark eNrjYmDJy89L5WSwCHAMCXEN8lNw8w_ydQzx9PdT8HUN8fB3UXD0c1EI8PeJ9HUNUnD08fGPVHByDHZVACpyDfJ09OFhYE1LzClO5YXS3AzKbq4hzh66qQX58anFBYnJqXmpJfHeQUYGhsYGBqYmlhZGjsbEqQIAEwcrEQ
ContentType Patent
DBID EVB
DatabaseName esp@cenet
Database_xml – sequence: 1
  dbid: EVB
  name: esp@cenet
  url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP
  sourceTypes: Open Access Repository
DeliveryMethod fulltext_linktorsrc
Discipline Medicine
Chemistry
Sciences
Physics
ExternalDocumentID KR20130054982A
GroupedDBID EVB
ID FETCH-epo_espacenet_KR20130054982A3
IEDL.DBID EVB
IngestDate Fri Jul 19 11:41:21 EDT 2024
IsOpenAccess true
IsPeerReviewed false
IsScholarly false
Language English
Korean
LinkModel DirectLink
MergedId FETCHMERGED-epo_espacenet_KR20130054982A3
Notes Application Number: KR20137001360
OpenAccessLink https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20130527&DB=EPODOC&CC=KR&NR=20130054982A
ParticipantIDs epo_espacenet_KR20130054982A
PublicationCentury 2000
PublicationDate 20130527
PublicationDateYYYYMMDD 2013-05-27
PublicationDate_xml – month: 05
  year: 2013
  text: 20130527
  day: 27
PublicationDecade 2010
PublicationYear 2013
RelatedCompanies KABUSHIKI KAISHA TOSHIBA
RelatedCompanies_xml – name: KABUSHIKI KAISHA TOSHIBA
Score 2.8734734
SourceID epo
SourceType Open Access Repository
SubjectTerms APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
MATERIALS THEREFOR
MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES
MICROSTRUCTURAL TECHNOLOGY
NANOTECHNOLOGY
ORIGINALS THEREFOR
PERFORMING OPERATIONS
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
SEMICONDUCTOR DEVICES
SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
TRANSPORTING
Title PATTERN FORMATION METHOD AND POLYMER ALLOY BASE MATERIAL
URI https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20130527&DB=EPODOC&locale=&CC=KR&NR=20130054982A
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfR3ZSsNAcKj1fNOqeFRZUPIWbI5mm4ciuUqwuYhR2qeyuUCUttiIv-9kTbVPfZ1ZhtmFOXcOgHsm9cqSlpmo0VIXVU3ri3qhMDFXe1lBaaoyte539gPNfVGfJv1JCz7WvTB8Tug3H46IEpWhvFdcXy__k1g2r61cPaRvCFo8jpKhLTTRMSrkvkwF2xw6UWiHlmBZw3EsBPEvDt0TfSAbO7BbO9L1pH3n1az7UpabRmV0DHsR0ptXJ9B6X3Tg0FrvXuvAgd98eXdgn9doZisENnK4OoVBZCT1KFuCMZzPs0zEdxI3tIkR2CQKvanvxMTwvHBKTOPZIXgIIzbDO4O7kZNYrojMzP7uPhvHm5wr59CeL-bFBRBFLXOJaXlPLhgaGMpyPUMrNFBQ81GJSZfQ3Ubpajv6Go5kvvehbljrQrv6_Cpu0PpW6S1_tB9nBIH4
link.rule.ids 230,309,786,891,25594,76903
linkProvider European Patent Office
linkToHtml http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV1LT8JAEJ4gPvCmKPGBuommt0b6oEsPxJS2pEpfqdXAqVn6SIwGiNT4952uoJy4zmwms5vMzH6zOzMAd0zqFAUtUlGjhS6qmtYV9VxhYqZ20pzSqcrUqt7Z8zXnRX0ad8c1-FjXwvA-od-8OSJaVIr2XnJ_vfhPYln8b-XyfvqGpPnDMO5bwgodo0PuylSwBn07DKzAFEyzP4oEP_rl4fVE78nGDuxSBIUcLL0OqrqUxWZQGR7BXojyZuUx1N7nTWiY69lrTTjwVk_eTdjnfzTTJRJXdrg8gV5oxFUrW4IYzuNZJuLZsRNYxPAtEgbuxLMjYrhuMCED49kmuAgRm-Gewu3Qjk1HRGWSv70no2hTc6UF9dl8lp8BUdQik5iWdeScYYChLNNTjEI9BT0flZh0Du1tki62s2-g4cSem7iP_ugSDmU-A6IqXmtDvfz8yq8wEpfTa36AP5-qhOI
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=PATTERN+FORMATION+METHOD+AND+POLYMER+ALLOY+BASE+MATERIAL&rft.inventor=ASAKAWA+KOJI&rft.inventor=KITAGAWA+RYOTA&rft.inventor=HATTORI+SHIGEKI&rft.inventor=KANNO+MASAHIRO&rft.inventor=SEINO+YURIKO&rft.inventor=NAKAMURA+HIROKO&rft.inventor=HIGA+MOMOKA&rft.date=2013-05-27&rft.externalDBID=A&rft.externalDocID=KR20130054982A