A SEMICONDUCTOR MEMORY DEVICE AND A METHOD OF FORMING THE SAME
PURPOSE: A semiconductor memory device and a forming method thereof are provided to prevent a bowing phenomenon by including germanium oxide in a support pattern. CONSTITUTION: A storage node(250) is arranged on a substrate. A capacitor dielectric layer(260) surrounds the storage node. An electrode...
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Format | Patent |
Language | English Korean |
Published |
08.05.2013
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Online Access | Get full text |
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Abstract | PURPOSE: A semiconductor memory device and a forming method thereof are provided to prevent a bowing phenomenon by including germanium oxide in a support pattern. CONSTITUTION: A storage node(250) is arranged on a substrate. A capacitor dielectric layer(260) surrounds the storage node. An electrode layer(270) covers the storage node and the capacitor dielectric layer. One or more support patterns(220,240) support the storage node. The support pattern includes germanium oxide. |
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AbstractList | PURPOSE: A semiconductor memory device and a forming method thereof are provided to prevent a bowing phenomenon by including germanium oxide in a support pattern. CONSTITUTION: A storage node(250) is arranged on a substrate. A capacitor dielectric layer(260) surrounds the storage node. An electrode layer(270) covers the storage node and the capacitor dielectric layer. One or more support patterns(220,240) support the storage node. The support pattern includes germanium oxide. |
Author | HONG, EUN KEE HWANG, KWANG TAE KIM, HYONG SOO |
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RelatedCompanies | SAMSUNG ELECTRONICS CO., LTD |
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Snippet | PURPOSE: A semiconductor memory device and a forming method thereof are provided to prevent a bowing phenomenon by including germanium oxide in a support... |
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Title | A SEMICONDUCTOR MEMORY DEVICE AND A METHOD OF FORMING THE SAME |
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