EXPOSURE APPARATUS AND EXPOSURE METHOD THEREOF

PURPOSE: An exposure apparatus is provided to reduce alignment errors between a mask and an exposure object and to improve the quality and/or yield of an exposure object. CONSTITUTION: An exposure apparatus(1) comprises a mask holder(13), a support part(11), a sensing part(15), an exposure part(19),...

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Bibliographic Details
Main Author SEO, BYUNG KYU
Format Patent
LanguageEnglish
Korean
Published 20.02.2013
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PURPOSE: An exposure apparatus is provided to reduce alignment errors between a mask and an exposure object and to improve the quality and/or yield of an exposure object. CONSTITUTION: An exposure apparatus(1) comprises a mask holder(13), a support part(11), a sensing part(15), an exposure part(19), and a control part(23). The support part transfers the exposure garget object between a first location and a second location and aligns the exposure target objects with the mask. The sensing part senses a first target which is formed in the exposure object. The exposure part exposes the exposure target object through the mask. When the exposure part exposes the exposure target object through the mask, the control part controls the support part to align the exposure target object with a first mask of the exposure target object which is sensed by the sensing part.
Bibliography:Application Number: KR20110080608