METHOD FOR MANUFACTURING NANO STRUCTURE

PURPOSE: A manufacturing method of nanostructures is provided to easily manufacture nanostructures on a large area support only by using self-assembly property and shear force of block copolymers. CONSTITUTION: A manufacturing method of nanostructures comprises the following steps: forming a block c...

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Bibliographic Details
Main Author LIM, JUNG KU
Format Patent
LanguageEnglish
Korean
Published 09.01.2013
Subjects
MANUFACTURE OR TREATMENT THEREOF
NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS,MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES ASDISCRETE UNITS
NANOTECHNOLOGY
PERFORMING OPERATIONS
TRANSPORTING
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Summary:PURPOSE: A manufacturing method of nanostructures is provided to easily manufacture nanostructures on a large area support only by using self-assembly property and shear force of block copolymers. CONSTITUTION: A manufacturing method of nanostructures comprises the following steps: forming a block copolymer coating film(120) on a support(110); setting arrangement direction of patterns by applying shear force to the formed coating film toward one-direction; and forming a pattern by inducing self-assembly of the block copolymer by heat-treating the coating film. The block copolymer is a polystyrene-polymethylmethacrylate block copolymer, a polystyrene-polybutadiene block copolymer, a polystyrene-polyethylene oxide block copolymer, a polystyrene-polyvinyl pyridine block copolymer, a polystyrene-polyethylene propylene block copolymer, or a polystyrene-polyisoprene block copolymer. [Reference numerals] (AA) Shear force; (BB) Pattern forming direction; (CC) Pattern arrangement direction
Bibliography:Application Number: KR20110065405