COATING DEVICE AND COATING METHOD

PURPOSE: A coating apparatus and a coating method are provided to prevent a coated resist film from being irregular and to suppress the floated amount change of a substrate. CONSTITUTION: A coating apparatus includes a coating part(3), a floating part, and a driving part. The coating part includes a...

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Bibliographic Details
Main Authors SAKAMAKI TAKUJI, KAJIMA ATSUO, KATO SHIGERU
Format Patent
LanguageEnglish
Korean
Published 12.12.2012
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:PURPOSE: A coating apparatus and a coating method are provided to prevent a coated resist film from being irregular and to suppress the floated amount change of a substrate. CONSTITUTION: A coating apparatus includes a coating part(3), a floating part, and a driving part. The coating part includes a nozzle. The floating part includes a guiding side, a gas supplying part, and a suction part. The driving part faces a floated substrate and the tip end part of the nozzle and drives at least either the substrate or the nozzle. The nozzle discharges liquid through the tip end part toward the substrate. The guiding side of the floating part guides the substrate. The gas supplying part floats the substrate with respect to the guiding side.
Bibliography:Application Number: KR20120054082