TEMPLATE, SURFACE PROCESSING METHOD OF TEMPLATE, SURFACE PROCESSING APPARATUS OF TEMPLATE, AND PATTERN FORMATION METHOD

• Main Authors: KOBAYASHI MASAKO, KAWAMURA YOSHIHISA, HIRABAYASHI HIDEAKI, HIGA MOMOKA
• Format: Patent
• Language: English; Korean
• Published: 08.10.2012
• Subjects: AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING; APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES; MATERIALS THEREFOR; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; NANOTECHNOLOGY; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR; SHAPING OR JOINING OF PLASTICS; SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; TRANSPORTING; WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

PURPOSE: A template, a method and apparatus for processing the surface of the template and a method for forming a pattern is provided to reduce the price of a device by omitting a short wavelength light source and lens. CONSTITUTION: An unevenness pattern(11) includes a concave part(11d) and a convex part(11p). A base member(20) includes a main surface(20a) having unevenness(21). The unevenness includes a base member concave part(21d) and a base member convex part(21p). A surface layer(25) coats the unevenness of the base member. The thickness of the surface layer is thinner than the unevenness.