LIGHT-SENSITIVE POLYMER COMPOSITION, METHOD FOR PRODUCING PATTERN, AND ELECTRONIC COMPONENT
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| Main Authors | , , , , |
|---|---|
| Format | Patent |
| Language | English Korean |
| Published |
17.09.2012
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| Subjects | |
| Online Access | Get full text |
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| Author | KONNO TAKU MINEGISHI TOMONORI ONO KEISHI KOTANI MASASHI OOE MASAYUKI |
|---|---|
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| RelatedCompanies | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD |
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| SubjectTerms | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS |
| Title | LIGHT-SENSITIVE POLYMER COMPOSITION, METHOD FOR PRODUCING PATTERN, AND ELECTRONIC COMPONENT |
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