PHOTOSENSITIVE COMPOSITION

• Main Authors: SHIRAISHI ATSUSHI, MUKAI TAKAO, MOTOFUJI SHIHEI, HIGUCHI SHINTARO, SAKAKIBARA MEGUMU
• Format: Patent
• Language: English; Korean
• Published: 29.03.2012
• Subjects: ACYCLIC OR CARBOCYCLIC COMPOUNDS; ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM; ADHESIVES; APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMICAL PAINT OR INK REMOVERS; CHEMISTRY; CINEMATOGRAPHY; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS; COMPOSITIONS BASED THEREON; CORRECTING FLUIDS; DYES; ELECTROGRAPHY; FILLING PASTES; HOLOGRAPHY; INKS; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS; MATERIALS THEREFOR; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; ORGANIC CHEMISTRY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PAINTS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; POLISHES; THEIR PREPARATION OR CHEMICAL WORKING-UP; USE OF MATERIALS THEREFOR; WOODSTAINS

The present invention has its object to provide a photosensitive composition that is cured by a small amount of energy even in the case where the composition contains high concentrations of colorants and the like substances that cause emitted light to be attenuated or to be blocked or where a thick coating is formed. The photosensitive composition of the present invention includes: (1) a radical initiator (A); (2) an acid generator (B) or a base generator (C); (3) a polymerizable substance (D); and (4) a colorant (E), a metal oxide powder (F), or a metal powder (G), wherein at least one of the radical initiator (A), the acid generator (B) and the base generator (C) generates an active species (H) on exposure to active rays, the active species (H) reacts with the radical initiator (A), the acid generator (B) or the base generator (C) to generate another active species (I), the active species (I) in turn causes the polymerizable substance (D) to be polymerized, and the active species (H) or (I) is an acid or a base.