METHODS FOR PREVENTING PRECIPITATION OF ETCH BYPRODUCTS DURING AN ETCH PROCESS AND/OR A SUBSEQUENT RINSE PROCESS

• Main Authors: DEYOUNG JAMES P, WAGNER MARK I
• Format: Patent
• Language: English; Korean
• Published: 07.10.2011
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

Methods for processing a microelectronic topography include selectively etching a layer of the topography using an etch solution which includes a fluid in a supercritical or liquid state. In some embodiments, the etch process may include introducing a fresh composition of the etch solution into a pr...