E-BEAM EXPOSURE APPARATUS COMPRISING FOGGING NORMALIZER

• Main Author: GYUN, BYUNG GU
• Format: Patent
• Language: English; Korean
• Published: 13.07.2011
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PURPOSE: An electron beam exposure equipment including a fogging normalizer is provided to distribute widely electrons on a photo mask, to induce fogging of the widely distributed electrons, and to restrict widening of a photo mask pattern locally in a specific region. CONSTITUTION: An electron beam column part(101) projects electron beam on a photomask(300). A fogging normalizer(210) includes a body and electrons. The body faces a surface of the photomask under the electron beam column. The electrons of the fogging normalizer induce an electric field for reflecting electrons, incident from the surface of the photomask with a reflection angle which is more than an incidence angle. The electrons of the fogging normalizer are aligned from an inner side to an outer side of the body surface so that the electric field gets diminished from an inner side to an outer side.