APPARATUS AND METHOD FOR MEASURING RADIATION ENERGY DURING THERMAL PROCESSING
Embodiments of the present invention provide apparatus and method for reducing heating source radiation influence in temperature measurement during thermal processing. In one embodiment of the present invention, background radiant energy, such as an energy source of a thermal processing chamber, is...
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Format | Patent |
Language | English Korean |
Published |
16.03.2011
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Abstract | Embodiments of the present invention provide apparatus and method for reducing heating source radiation influence in temperature measurement during thermal processing. In one embodiment of the present invention, background radiant energy, such as an energy source of a thermal processing chamber, is marked within a selected spectrum, a characteristic of the background is then determined by measuring radiant energy at a reference wavelength within the selected spectrum and a comparing wavelength just outside the selected spectrum. |
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AbstractList | Embodiments of the present invention provide apparatus and method for reducing heating source radiation influence in temperature measurement during thermal processing. In one embodiment of the present invention, background radiant energy, such as an energy source of a thermal processing chamber, is marked within a selected spectrum, a characteristic of the background is then determined by measuring radiant energy at a reference wavelength within the selected spectrum and a comparing wavelength just outside the selected spectrum. |
Author | RANISH JOSEPH M HUNTER AARON KOELMEL BLAKE |
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Snippet | Embodiments of the present invention provide apparatus and method for reducing heating source radiation influence in temperature measurement during thermal... |
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SubjectTerms | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES |
Title | APPARATUS AND METHOD FOR MEASURING RADIATION ENERGY DURING THERMAL PROCESSING |
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