AL DEPOSIT FILM

PURPOSE: A deposition film is provided to maintain the deposition strength to be more than the reference strength after processes with high temperature and high temperature water. CONSTITUTION: A polyurethane coating layer(20) and an aluminum deposition layer(30) are successively stacked on one side...

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Main Authors PARK, JOON SUB, PARK, HAN SOO
Format Patent
LanguageEnglish
Korean
Published 08.03.2011
Subjects
AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G
CHEMISTRY
COMPOSITIONS BASED THEREON
GENERAL PROCESSES OF COMPOUNDING
LAYERED PRODUCTS
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
PERFORMING OPERATIONS
THEIR PREPARATION OR CHEMICAL WORKING-UP
TRANSPORTING
WORKING-UP
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Abstract PURPOSE: A deposition film is provided to maintain the deposition strength to be more than the reference strength after processes with high temperature and high temperature water. CONSTITUTION: A polyurethane coating layer(20) and an aluminum deposition layer(30) are successively stacked on one side of a base film(10). The dried coating thickness of the polyurethane coating layer is between 35 and 50nm using a water-dispersed polyurethane coating composition. The water-dispersed polyurethane coating composition is based on 0.5 to 1.0 weight% of polyurethane resin solid and 0.01 to 0.5 weight% of a silicon-based wetting agent.
AbstractList PURPOSE: A deposition film is provided to maintain the deposition strength to be more than the reference strength after processes with high temperature and high temperature water. CONSTITUTION: A polyurethane coating layer(20) and an aluminum deposition layer(30) are successively stacked on one side of a base film(10). The dried coating thickness of the polyurethane coating layer is between 35 and 50nm using a water-dispersed polyurethane coating composition. The water-dispersed polyurethane coating composition is based on 0.5 to 1.0 weight% of polyurethane resin solid and 0.01 to 0.5 weight% of a silicon-based wetting agent.
Author PARK, JOON SUB
PARK, HAN SOO
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Snippet PURPOSE: A deposition film is provided to maintain the deposition strength to be more than the reference strength after processes with high temperature and...
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SubjectTerms AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G
CHEMISTRY
COMPOSITIONS BASED THEREON
GENERAL PROCESSES OF COMPOUNDING
LAYERED PRODUCTS
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
PERFORMING OPERATIONS
THEIR PREPARATION OR CHEMICAL WORKING-UP
TRANSPORTING
WORKING-UP
Title AL DEPOSIT FILM
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