COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST

• Main Authors: ONGAYI OWENDI, JAIN VIPUL, COLEY SUZANNE, LIU CONG, ZAMPINI ANTHONY
• Format: Patent
• Language: English; Korean
• Published: 30.11.2010
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HETEROCYCLIC COMPOUNDS; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC CHEMISTRY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; THEIR PREPARATION OR CHEMICAL WORKING-UP

PURPOSE: A coating composition is provided to be applied by spin-coating(spin-on composition), to be mixed as a solvent composition, and to be useful as a planarization or via-fill composition. CONSTITUTION: A cyanurate compound comprises the substitution of a plurality of cyanurate nitrogen rings by separate carboxy and/or carboxy ester group. The compound is represented by chemical formula I. In chemical formula I, at least two of R^1OOC(CX_2)_n-, R^2- and R^3OOC(CX_2)_m- radicals are different acidor ester group; R^1, R^2, R^3 and each X are independently hydrogen or non-hydrogen substituent; and n and m are the same or different and are a natural number.