COMPOSITION FOR FORMING COATING AND COATING FORMED OF COMPOSTION

A composition for forming a coating film is provided to obtain a silica-based coating film having a relatively low dielectric constant and improved mechanical strength and electrical properties. A composition for forming a coating film comprises a siloxane polymer obtained by hydrolyzing a silane co...

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Bibliographic Details
Main Authors KOBARI HIDEYA, LIDA HIROYUKI
Format Patent
LanguageEnglish
Published 15.05.2008
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Summary:A composition for forming a coating film is provided to obtain a silica-based coating film having a relatively low dielectric constant and improved mechanical strength and electrical properties. A composition for forming a coating film comprises a siloxane polymer obtained by hydrolyzing a silane compound containing an alkoxysilane compound represented by the formula of R1nSi(OR2)4-n (wherein R1 is a C1-C20 organic group, R2 is a C1-C4 alkyl group, and n is 1 or 2), followed by carrying out condensation, wherein the alkoxysilane compound represented by the above formula is present in a mole fraction of 0.5 or higher in the silane compound.
Bibliography:Application Number: KR20070110813