METHOD OF PRODUCING SIO2 PARTICLES
Polishing compositions are described that are appropriate for fine polishing to very low tolerances. The polishing compositions include particles with small diameters with very narrow distributions in size and effectively no particles with diameters several times larger than the average diameter. Fu...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
23.02.2006
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Subjects | |
Online Access | Get full text |
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