METHOD FOR MANUFACTURING DEVICE HAVING REFLECTIVE MASK AND COMPUTER PROGRAM THEREOF

• Main Authors: LOWISCH MARTIN, MCGOO ELAINE, MICKAN UWE, VANINGENSCHENAU KOEN, DIERICHS MARCEL MATHIJS THEODORE MARIE, VAN DER LAAN HANS, LEENDERS MARTINUS HENDRIKUS ANTONIUS
• Format: Patent
• Language: English; Korean
• Published: 05.06.2004
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PURPOSE: A device manufacturing method and a computer program thereof are provided to improve an imaging characteristic of the device by using a reflective mask and an inclined light source. CONSTITUTION: A substrate is provided. At least a portion of the substrate is covered with a radiation resistive layer. A projection beam(PB) of the radiation is provided by using a radiation system. A pattern is provided to a cross-section of the projection beam by using a reflective mask(MA) on which the pattern is formed by a thick radiation absorber. The patterned beam is projected on a target point(C) of the radiation resistive layer. A system aberration in the projection system is controlled to compensate for mask-induced imaging artifacts. the radiation absorber is thick relative to a wavelength of the patterned beam of radiation.