DISK FARADAY OF A ION IMPLANTER

• Main Author: SONG, YEONG SU
• Format: Patent
• Language: English; Korean
• Published: 17.04.2004
• Edition: 7
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

PURPOSE: A disc faraday of ion implantation equipment is provided to be capable of vertically supplying ion beam to a wafer for reducing the shift phenomenon of a resist sheet and stably carrying out an ion implantation process. CONSTITUTION: A disc faraday of ion implantation equipment is provided...