MONITORING DEVICE AND METHOD FOR PLASMA PROCESS SYSTEM

PURPOSE: An apparatus and a method for monitoring a plasma processing apparatus are provided to be capable of predicting the generation of abnormal discharge and detecting rapidly the generation. CONSTITUTION: A process chamber(100) of a plasma processing apparatus is a vacuum container capable of a...

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Bibliographic Details
Main Authors YAMAMOTO HIDEYUKI, SASAKI ICHIRO, FURUSE MUNEO, MASUDA TOSHIO
Format Patent
LanguageEnglish
Korean
Published 12.06.2003
Edition7
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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