Novel Methacrylates Having Lactone Structure Polymers Photoresist Compositions and Patterning Process

• Main Authors: KINSHO TAKESHI, WATANABE TAKERU, HASEGAWA KOJI
• Format: Patent
• Language: English; Korean
• Published: 19.03.2003
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HETEROCYCLIC COMPOUNDS; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC CHEMISTRY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; THEIR PREPARATION OR CHEMICAL WORKING-UP

PURPOSE: To provide a polymer having high transparency, especially at excimer laser exposure wavelength. CONSTITUTION: The (meth)acrylate compound giving the polymer is shown by the general formula (1) (where, R¬1 is H or CH3, R¬2 and R¬3 are each H or an alkyl; X is a group forming a norbornane rin...