Plasma treatment system

PURPOSE: A plasma processing apparatus is provided to reduce a time for a plasma process and improve productivity by loading a plurality of plasma processing objects within a short time. CONSTITUTION: A chamber(100) has a gas inlet hole(110) and a gas outlet hole(120). A support portion(200) is inst...

Full description

Saved in:
Bibliographic Details
Main Authors PARK, GI RYUN, LEE, GYO UNG, JU, SEONG HU
Format Patent
LanguageEnglish
Korean
Published 19.09.2002
Edition7
Subjects
ELECTRIC HEATING
ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
Online AccessGet full text

Cover

Be the first to leave a comment!
You must be logged in first