POLYMER AND PHOTORESIST COMPOSITION

• Main Authors: BARCLAY GEORGE G, ZAMPINI ANTHONY
• Format: Patent
• Language: English; Korean
• Published: 26.09.2001
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; THEIR PREPARATION OR CHEMICAL WORKING-UP; USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS

PURPOSE: Provided are a polymer containing at least one of cyclic olefin monomers having pendant cyclic electron taking groups as a polymerization unit, a method for preparing the polymer and a photo-resist composition containing the polymer as a resin binder to form relief images. CONSTITUTION: The polymer comprises at least one of cyclic olefine monomers defined as the following formula(1) or (2) (wherein A is O, S, CH2 or NR1; R1 is phenyl, substituted phenyl, benzyl, substituted benzyl, (C1-C8) alkyl or substituted (C1-C8) alkyl; G is C(Z'), O, S or NR2; wherein R2 is (C1-C8) alkyl or substituted (C1-C8) alkyl; E and W are independently and selected from C(Z'), O, NR2 and chemical bonds; wherein Z' is O or S; Q is chemical bond or linking groups; n is 0 to 3; m is 0 to 2; m' is 0 to 2; l is 0 to 5; p is 0 to 5; (provided that l+p is 3 to 5); when A is O, S or NR1, n is 1; and T and L together are combined and selected from duplex bonds and 5- to 8-membered unsaturated rings); and optionally, at least one of ethylene- or acetylene-unsaturated monomers.